The JY-S100 ion sputtering instrument is a compact desktop coating system, particularly suitable for high-quality coating of non-conductive samples in scanning electron microscopy imaging.
Main characteristics
By using an efficient low-voltage DC magnetron head for cold state fine spraying process, the surface of the sample is avoided from being damaged.
The operation is easy and fast, and the controlled parameters include gas release and argon gas exchange control.
The digital spray coating current control is not affected by the air pressure in the sample chamber, and can achieve consistent coating rate and high-quality coating effect.
Multiple metal target materials can be used: Au, Au/Pd, Pt, Pt/Pd (Au target is standard), and target material replacement is fast and convenient.
Technical Parameter
Sputtering System |
|
Sample compartment size | 120 x120mm |
Target material |
AuTarget as standard,Optional Pt, diameter 57mm x 01mmthick |
Standard Sample Stand |
Can be loaded12 individualSEM The sample holder has a height adjustable range of60mm |
※ Rotating tilted sample stage (optional)) |
Rotation speed:0~60rpmContinuously adjustable, tilt angle:-90°~ 90° continuously adjustable; Stainless steel chamber: diameter120mm Xtall75mm; Observation window: diameter120mm Xtall45mm; Standard rotating table diameter40mm, can be placed4 A standard sample table, other specifications can be customized; Equipped with a dual locking device, it ensures that the sample will not loosen or fall off when rotating or tilting. |
Sputtering current |
Microprocessor control, safety interlock, adjustable, current5~30mAProgrammatic digital control |
Gauges |
Vacuum:Atm-1*10-3mbarCurrent:0~99mA |
Control method |
A microprocessor controller with "start" and "pause" buttons(1-999s)Automatically evacuate, sputter, and release air after shutdown. |
vacuum system |
|
pumping speed |
133L/MIN |
mbar |
10-4 mbarlevel |
noise |
56dB |